Electron Beam Lithography (EBL) system

The University of Ottawa is pleased to invite qualified proponents to submit a proposal for a high-performance Electron Beam Lithography (EBL) system to be acquired by the University of Ottawa. Proposals must include the delivery of the turnkey system
                (such as but not limited to the e-beam system, environmental mitigation measures, and all necessary components to deliver the turnkey solution) installation on site within the footprint that is allowable for the equipment, demonstration of performance and training. The Proponents are responsible for all the costs related to delivering, commissioning and demonstrating compliance of this turnkey solution inside the lab space (see attached ARC building lab 333B v6r1 drawing), and to provide training.


                General Description:

1.2.2        Electron-beam lithography (EBL) is a high-resolution pattern generation technique widely used in device research and development in the field of quantum sciences, optics, semiconductor processing, and microelectronics. Proposals are solicited from vendors to provide, deliver, install and commission the turnkey solution (EBL system, environmental chamber, etc.). The system must operate in a multi-user facility, where a diverse set of users will be trained to operate the tool and carry out individual lithography projects. The users consist of graduate students (master’s, Ph.D.) as well as post-doctoral fellows and technologists. Specific requirements and features are listed below. All submissions should include information on warranty and available service contracts for maintenance and upgrades with their proposal.

1.2.3        A on site survey carried out by the proponent, either recently (over the last 12 months) or during the RFP posting period, but no later than the submission deadline is required to meet the mandatory requirements of this Request for Proposal. Any request for a site survey must be requested to the contracting authority listed in the RFP. Any Site survey request will only be accepted if the site survey can take place within 10 calendar days of the request. The University of Ottawa is not responsible for any of the costs associated with performing the site survey. Proponents must include environmental mitigation measures for temperature, humidity, EMI, vibration such as an environmental chamber and vibration isolation platforms, specified based on results obtained from their site survey.

1.2.4      Given appended description of the space, and site survey results obtained by the proponent, environmental mitigation measures must be included in the proposal for: (i) temperature and humidity fluctuations (such as an environmental chamber), (ii) Electromagnetic interference (EMI) (such as a field cancellation system), and (iii) structural vibrations (such as vibration isolation platform). These mitigation measures must be selected based on results obtained from a site survey conducted by the proponent at the proposed location of the equipment.

Specifications listed in Appendix A – Technical Specifications Compliance Form of this RFP are the mandatory minimum requirements for the e-beam lithograhy system.
 

1. 1. - Location of Equipment:

1.3.1        ARC 333B (drawing v6r1 attached). This is a white cleanroom space with the following specifications: ISO 7, 60 ACH, Temp: 20°C Δ ± 1°C, RH.: 40% Δ ± 3%, Min. 6.2 ACH Fresh Air. Service bay accessible directly through north wall.

1.3.2      Any supplier wanting to submit a bid submission must have completed a on site survey of the lab. Any supplier that does not complete a site survey will not be eligible to submit a bid for this Request for Proposal and will not move into the evaluation stage of this procurement process.

1.3.3      The University has included a lab drawing # 6vr1 (ARC-333B with dimensions attached) to shown the systems maximum dimensions , a ARC Building – 25 Templeton Clear Path of Travel  floor egress drawing (see attached) with dimensions and elevator capacity to provide the maximum dimensions of doors, elevator and hallways from the loading dock to the lab space.and  , ARC 333 (NanoFab) mechanical and electrical  parameters for your convenience.


1.3.4        Should any equipment included in a proposal be superseded by a newer model during the period between the award of contract and the delivery date, the successful Proponent will be required to inform the University of Ottawa of the new specifications, the newer model pricing will remain the same as what was offered in the RFP. At its sole discretion, the University of Ottawa may opt to make changes from the list of equipment by altering, adding, or deducting some equipment.
 

Bidding and Documents are available on http://www.merx.com. Fees may apply; See https://www.merx.com/public/pricing for more information.